Systems and methods for alignment of wavelength beam combining resonators

ABSTRACT

In various embodiments, alignment systems for laser resonators generate near-field and/or far-field images of input beams produced by the laser resonators to enable the alignment of the input beams.

RELATED APPLICATIONS

This application claims the benefit of and priority to U.S. ProvisionalPatent Application No. 62/797,438, filed Jan. 28, 2019, the entiredisclosure of which is hereby incorporated herein by reference.

TECHNICAL FIELD

In various embodiments, the present invention relates to laser systems,specifically methods and systems for alignment of laser systems withmultiple beam emitters.

BACKGROUND

High-power laser systems are utilized for a host of differentapplications, such as welding, cutting, drilling, and materialsprocessing. Such laser systems typically include a laser emitter, thelaser light from which is coupled into an optical fiber (or simply a“fiber”), and an optical system that focuses the laser light from thefiber onto the workpiece to be processed. Optical systems for lasersystems are typically engineered to produce the highest-quality laserbeam, or, equivalently, the beam with the lowest beam parameter product(BPP). The BPP is the product of the laser beam's divergence angle(half-angle) and the radius of the beam at its narrowest point (i.e.,the beam waist, the minimum spot size). That is, BPP=NA×D/2, where D isthe focusing spot (the waist) diameter and NA is the numerical aperture;thus, the BPP may be varied by varying NA and/or D. The BPP quantifiesthe quality of the laser beam and how well it can be focused to a smallspot, and is typically expressed in units of millimeter-milliradians(mm-mrad). A Gaussian beam has the lowest possible BPP, given by thewavelength of the laser light divided by pi. The ratio of the BPP of anactual beam to that of an ideal Gaussian beam at the same wavelength isdenoted M², which is a wavelength-independent measure of beam quality.

Wavelength beam combining (WBC) is a technique for scaling the outputpower and brightness from laser diodes, laser diode bars, stacks ofdiode bars, or other lasers arranged in a one- or two-dimensional array.WBC methods have been developed to combine beams along one or bothdimensions of an array of emitters. Typical WBC systems include aplurality of emitters, such as one or more diode bars, that are combinedusing a dispersive element to form a multi-wavelength beam. Each emitterin the WBC system individually resonates, and is stabilized throughwavelength-specific feedback from a common partially reflecting outputcoupler that is filtered by the dispersive element along abeam-combining dimension. Exemplary WBC systems are detailed in U.S.Pat. No. 6,192,062, filed on Feb. 4, 2000, U.S. Pat. No. 6,208,679,filed on Sep. 8, 1998, U.S. Pat. No. 8,670,180, filed on Aug. 25, 2011,and U.S. Pat. No. 8,559,107, filed on Mar. 7, 2011, the entiredisclosure of each of which is incorporated by reference herein.

Various WBC laser systems combine beams emitted by beam emitters along asingle direction, or dimension, termed the “WBC dimension.” Accordingly,WBC systems, or “resonators,” often feature their various componentslying in the same plane in the WBC dimension. The dimensionperpendicular to the WBC dimension, in which the beams are not combined,is typically termed the “non-WBC dimension.”

As disclosed in some of the references mentioned above, WBC lasersystems often feature diode bars, or other multi-beam emitters, theoutputs of which are combined into a single output beam. A typical WBCresonator includes a dispersion element and a downstream feedbacksurface, which provides (e.g., by reflection) a feedback beam to eachcorresponding emitter to stabilize the resonator by locking each emitterto its corresponding lasing wavelength. In order to optimize the WBCresonator, the combined beam in the resonator is generally aligned to benormal to the feedback surface in both WBC and non-WBC dimensions.

Advantageously, WBC resonators are often self-adaptive to certain degreeof misalignment in the WBC dimension, because the resonator will simplylock to a different wavelength propagating in the direction normal tothe feedback surface in the WBC dimension. If the new lasing wavelengthis within a substantially flat region of the emitter gain curve and themisalignment is not causing noticeable power clipping on the optics inthe resonator, misalignment in WBC dimension will often not affectresonator power and stability.

However, the alignment of the WBC resonator in the non-WBC dimension ismore challenging. Since the WBC resonator is effectively an assembly ofmany independent single-beam resonators, each single-beam resonatorwould ideally be aligned independently. Particularly in systems in whichthe emitters are diode bars or other multi-emitter sources, WBCresonator performance relies on the alignment of individualsub-resonators corresponding to the individual diode bars. Thus, thereis a need for systems and methods that enable the optimized alignment ofWBC resonators and the beam sources thereof, particularly in the non-WBCdimension.

SUMMARY

Systems and techniques in accordance with embodiments of the presentinvention detect and enable alleviation of emitter misalignment in laserresonators (e.g., WBC resonators) in which the beams from multiple beamemitters are spatially overlapped. In accordance with variousembodiments, a resonator beam (e.g., a WBC resonator beam) isde-multiplexed, and near-field and far-field images of the resultingsub-beams are generated (either serially or simultaneously) via a beamprofiling system. The resulting images reveal beam decentering andpointing errors that may be reduced or substantially eliminated viaadjustment of one or more optical elements in the laser system. Forexample, interleaver mirrors may be tilted, and/or lenses (e.g., SAClenses or other lenses adjusting the beam in the slow axis and/ornon-WBC dimension) may be translated to adjust the alignment ofindividual beams.

As utilized herein, a “near-field image” corresponds to an image of abeam or sub-beam at the beam output (e.g., the output of a laserresonator). Typically, in the near-field, beams are relativelycollimated and have relatively large beam sizes. In various embodiments,near-field images may be produced via a projection of a beam orsub-beam, through no lenses having optical power in the WBC dimension(or, alternatively, another dimension of interest for imaging), onto thebeam profiling system. (In various embodiments, such beams or sub-beamsmay still propagate through lenses having no optical power in the WBCdimension to produce near-field images.) In other embodiments,near-field images may be produced by imaging the beam or sub-beam at thebeam output with an imaging lens (i.e., a lens having optical power inthe WBC dimension and that may be located an optical distance away fromthe beam output that corresponds to its focal length) onto the beamprofiling system. Near-field images may be utilized to monitor anddetermine the shape and size of beams or sub-beams at the beam output.

In contrast, a “far-field image” corresponds to an image of a beam orsub-beam at the focal plane of a lens, e.g., a lens located opticallydownstream of the beam output. In various embodiments, far-field imagesmay be produced via focusing of the beam or sub-beam with a lens, whichmay be located an optical distance away from the beam profiling systemthat corresponds to the focal length of the lens, onto the beamprofiling system. Far-field images may be utilized to monitor anddetermine the beam pointing (corresponding to the beam position at thebeam profiling system) and divergence (corresponding to the beam size atthe beam profiling system) of beams or sub-beams.

Alignment systems in accordance with various embodiments of the presentinvention feature optical elements (e.g., lenses, beam splitters,reflectors, and/or beam rotators) that may be, but are not necessarily,movable into and out of the path of the output beam of the resonator.The optical elements, and their positioning and/or movement, enable bothfar-field and near-field images to be generated with the beam profilingsystem. This also enables detection and correction of misalignment inboth the WBC and non-WBC dimensions, as the output beam may be rotatedby a beam rotator moved into the path of the beam. That is,de-multiplexing of the unrotated beam may be used to detect misalignmentin, e.g., the non-WBC dimension, and de-multiplexing of the rotated beammay be used to detect misalignment in, e.g., the WBC dimension. Opticalelements may be movable (e.g., translatable and/or tiltable) via use ofmechanized stages, gimbals, platforms, and/or mounts, as are known inthe art; thus, provision of movable optical elements may be accomplishedby those of skill in the art without undue experimentation.

Since many laser resonators utilize individual beams that are spatiallyoverlapped at the resonator output, alignment of such systems typicallyrequires the powering up of only a single emitter (e.g., diode bar) at atime, and only that resulting beam (or set of beams) is adjusted tooptimize the resulting sub-resonator established by the beam(s). Incontrast, embodiments of the present invention advantageouslyde-multiplex spatially overlapped beams so that one or more, or evenall, of the beams may be aligned at the same time. In this manner,embodiments of the invention enable the more efficient alignment ofmulti-emitter laser resonators. In addition, since individual poweringof single emitters is not required by embodiments of the presentinvention for alignment, the laser resonator power supply andpower-switching configuration may be simplified.

Systems and techniques in accordance with embodiments of the inventionmay be utilized with WBC resonators that include multiple diode bars asbeam emitters. Each beam emitter may have a corresponding interleavermirror and slow-axis collimation (SAC) lens, and the beams from all ofthe emitters may be combined optically downstream into amulti-wavelength output beam. Each diode bar may be coupled with afast-axis collimator and an optical rotator (or “optical twister”),which rotate the fast and slow axes of the beams by 90° in the planenormal to the beam propagation direction. In such WBC systems, the slowaxis of the beams is in the non-WBC dimension or direction opticallydownstream of the optical rotator. Thus, the emitters of a single diodebar may all be collimated in the slow axis by a single SAC lens (or“slow-axis collimator”).

Embodiments of the invention may be utilized to detect and compensateslow-axis pointing errors induced by, for example, tilt of a dispersiveelement in a WBC system in the non-WBC direction, as detailed in U.S.patent application Ser. No. 16/598,001, filed on Oct. 10, 2019 (the '001application), the entire disclosure of which is incorporated byreference herein. In addition, embodiments of the invention may beutilized to detect and then reduce or substantially eliminate beam smearusing arrays of SAC lenses that are “staircased,” i.e., varying inheight and/or position relative to each other, as detailed in the '001application.

In embodiments of the invention, beam emitters (or simply “emitters”)may include, consist essentially of, or consist of diode lasers, fiberlasers, fiber-pigtailed diode lasers, etc., and may be packagedindividually or in groups as one- or two-dimensional arrays. In variousembodiments, emitters or emitter arrays are high-power diode bars witheach bar having multiple (e.g., tens of) emitters. The emitters may havemicro-lenses attached thereto for emitter collimation and beam shaping.Transform optics, normally confocal and positioned between the emittersand a dispersive element (e.g., a diffraction grating), collimateindividual beams from different emitters and converge all the chief raysof the beams toward the center of the grating, particularly in the WBCdimension (i.e., the dimension, or direction, in which the beams arecombined). The main beam diffracted by the dispersive element propagatesto a partially reflective output coupler, which provides feedback toindividual emitters and defines wavelengths of individual emitters viathe dispersive element. That is, the coupler reflects a portion of thevarious beams back to their individual emitters, thereby formingexternal lasing cavities, and transmits the combined multi-wavelengthbeam for applications such as welding, cutting, machining, processing,etc. and/or for coupling into one or more optical fibers.

Various embodiments of the invention may be utilized with laser systemsfeaturing techniques for varying BPP of their output laser beams, suchas those described in U.S. patent application Ser. No. 14/632,283, filedon Feb. 26, 2015, and U.S. patent application Ser. No. 15/188,076, filedon Jun. 21, 2016, the entire disclosure of each of which is incorporatedherein by reference. Laser systems in accordance with embodiments of theinvention may also include power and/or spectral monitoringfunctionality, as detailed in U.S. patent application Ser. No.16/417,861, filed on May 21, 2019, the entire disclosure of which isincorporated herein by reference.

Herein, “optical elements” may refer to any of lenses, mirrors, prisms,gratings, beam splitters, and the like, which redirect, reflect, bend,or in any other manner optically manipulate electromagnetic radiation,unless otherwise indicated. Herein, beam emitters, emitters, or laseremitters, or lasers include any electromagnetic beam-generating devicesuch as semiconductor elements, which generate an electromagnetic beam,but may or may not be self-resonating. These also include fiber lasers,disk lasers, non-solid state lasers, etc. Generally, each emitterincludes a back reflective surface, at least one optical gain medium,and a front reflective surface. The optical gain medium increases thegain of electromagnetic radiation that is not limited to any particularportion of the electromagnetic spectrum, but that may be visible,infrared, and/or ultraviolet light. An emitter may include or consistessentially of multiple beam emitters such as a diode bar configured toemit multiple beams. The input beams received in the embodiments hereinmay be single-wavelength or multi-wavelength beams combined usingvarious techniques known in the art.

Although diffraction gratings are utilized herein as exemplarydispersive elements, embodiments of the invention may utilize otherdispersive elements such as, for example, dispersive prisms,transmission gratings, or Echelle gratings. Embodiments of the inventionmay utilize one or more prisms in addition to one or more diffractiongratings, for example as described in U.S. patent application Ser. No.15/410,277, filed on Jan. 19, 2017, the entire disclosure of which isincorporated by reference herein.

Embodiments of the present invention may couple multi-wavelength outputbeams into an optical fiber. In various embodiments, the optical fiberhas multiple cladding layers surrounding a single core, multiplediscrete core regions (or “cores”) within a single cladding layer, ormultiple cores surrounded by multiple cladding layers. In variousembodiments, the output beams may be delivered to a workpiece forapplications such as cutting, welding, etc.

Laser diode arrays, bars and/or stacks, such as those described in thefollowing general description may be used in association withembodiments of the innovations described herein. Laser diodes may bepackaged individually or in groups, generally in one-dimensionalrows/arrays (diode bars) or two dimensional arrays (diode-bar stacks). Adiode array stack is generally a vertical stack of diode bars. Laserdiode bars or arrays generally achieve substantially higher power, andcost effectiveness than an equivalent single broad area diode.High-power diode bars generally contain an array of broad-area emitters,generating tens of watts with relatively poor beam quality; despite thehigher power, the brightness is often lower than that of a broad arealaser diode. High-power diode bars may be stacked to produce high-powerstacked diode bars for generation of extremely high powers of hundredsor thousands of watts. Laser diode arrays may be configured to emit abeam into free space or into a fiber. Fiber-coupled diode-laser arraysmay be conveniently used as a pumping source for fiber lasers and fiberamplifiers.

A diode-laser bar is a type of semiconductor laser containing aone-dimensional array of broad-area emitters or alternatively containingsub arrays containing, e.g., 10-20 narrow stripe emitters. A broad-areadiode bar typically contains, for example, 19-49 emitters, each havingdimensions on the order of, e.g., 1 μm×100 μm. The beam quality alongthe 1 μm dimension or fast-axis is typically diffraction-limited. Thebeam quality along the 100 μm dimension or slow-axis or array dimensionis typically many times diffraction-limited. Typically, a diode bar forcommercial applications has a laser resonator length of the order of 1to 4 mm, is about 10 mm wide and generates tens of watts of outputpower. Most diode bars operate in the wavelength region from 780 to 1070nm, with the wavelengths of 808 nm (for pumping neodymium lasers) and940 nm (for pumping Yb:YAG) being most prominent. The wavelength rangeof 915-976 nm is used for pumping erbium-doped or ytterbium-dopedhigh-power fiber lasers and amplifiers.

A diode stack is simply an arrangement of multiple diode bars that candeliver very high output power. Also called diode laser stack, multi-barmodule, or two-dimensional laser array, the most common diode stackarrangement is that of a vertical stack which is effectively atwo-dimensional array of edge emitters. Such a stack may be fabricatedby attaching diode bars to thin heat sinks and stacking these assembliesso as to obtain a periodic array of diode bars and heat sinks. There arealso horizontal diode stacks, and two-dimensional stacks. For the highbeam quality, the diode bars generally should be as close to each otheras possible. On the other hand, efficient cooling requires some minimumthickness of the heat sinks mounted between the bars. This tradeoff ofdiode bar spacing results in beam quality of a diode stack in thevertical direction (and subsequently its brightness) is much lower thanthat of a single diode bar. There are, however, several techniques forsignificantly mitigating this problem, e.g., by spatial interleaving ofthe outputs of different diode stacks, by polarization coupling, or bywavelength multiplexing. Various types of high-power beam shapers andrelated devices have been developed for such purposes. Diode stacks mayprovide extremely high output powers (e.g. hundreds or thousands ofwatts).

Output beams produced in accordance with embodiments of the presentinvention may be utilized to process a workpiece such that the surfaceof the workpiece is physically altered and/or such that a feature isformed on or within the surface, in contrast with optical techniquesthat merely probe a surface with light (e.g., reflectivitymeasurements). Exemplary processes in accordance with embodiments of theinvention include cutting, welding, drilling, and soldering. Variousembodiments of the invention may also process workpieces at one or morespots or along a one-dimensional linear or curvilinear processing path,rather than flooding all or substantially all of the workpiece surfacewith radiation from the laser beam. Such one-dimensional paths may becomposed of multiple segments, each of which may be linear orcurvilinear.

In an aspect, embodiments of the invention feature an alignment systemfor use with a laser resonator that spatially overlaps multiple inputbeams along a wavelength-beam-combining (WBC) dimension and outputs aresulting output beam from a beam output. The alignment system includes,consists essentially of, or consists of a dispersive element, a beamprofiler, a first lens, and a second lens. The dispersive elementreceives the output beam and disperses the output beam to generate aplurality of dispersed beams in the WBC dimension. The beam profilerreceives the plurality of dispersed beams and generates images ofrelative positions of the dispersed beams received by the beam profiler.The first lens has optical power in a non-WBC dimension perpendicular tothe WBC dimension. The first lens is disposed optically downstream ofthe beam output and optically upstream of the beam profiler. The secondlens focuses the dispersed beams on or toward the beam profiler. Thesecond lens has optical power in the WBC dimension. The second lens isdisposed optically downstream of the beam output (e.g., opticallydownstream of the dispersive element) and optically upstream of the beamprofiler.

Embodiments of the invention may include one or more of the following inany of a variety of combinations. The dispersive element may include,consist essentially of, or consist of a diffraction grating. The firstlens may be disposed optically upstream of the dispersive element. Thefirst lens may only have optical power in the non-WBC dimension. A focallength of the first lens may be larger than a focal length of the secondlens. The first lens and/or the second lens may include, consistessentially of, or consist of one or more cylindrical lenses. Theoptical distance between the first lens and the beam profiler may beapproximately equal to a focal length of the first lens. The opticaldistance between the first lens and the beam profiler may be greaterthan a focal length of the first lens. The optical distance between thefirst lens and the beam output may be approximately equal to a focallength of the first lens. The optical distance between the second lensand the beam profiler may be approximately equal to a focal length ofthe second lens. The optical distance between the second lens and thedispersive element may be approximately equal to a focal length of thesecond lens. The second lens may only have optical power in the WBCdimension.

The first lens may be movable between (i) a first position within a pathof the output beam to thereby generate a far-field image via the beamprofiler, and (ii) a second position outside the path of the outputbeam, whereby a near-field image is generated via the beam profiler. Thealignment system may include a third lens. A focal length of the thirdlens may be less than a focal length of the first lens. The first lensand the third lens may be interchangeable within a path of the outputbeam such that (i) when the first lens is within the path of the outputbeam a far-field image is generated via the beam profiler and (ii) whenthe third lens is within the path of the output beam a near-field imageis generated via the beam profiler.

The alignment system may include a third lens disposed opticallydownstream of the beam output and optically upstream of the first lens.The third lens may have optical power in the non-WBC dimension. Thethird lens may only have optical power in the non-WBC dimension. A focallength of the third lens may be less than a focal length of the firstlens. The optical distance between the third lens and the beam outputmay be approximately equal to a focal length of the third lens. Theoptical distance between the third lens and the beam profiler may begreater than a focal length of the third lens. The third lens may bemovable between (i) a first position within a path of the output beam tothereby generate a near-field image via the beam profiler, and (ii) asecond position outside the path of the output beam, whereby a far-fieldimage is generated via the beam profiler.

The alignment system may include a beam rotator disposed opticallydownstream of the beam output. The beam rotator may be configured torotate the output beam by approximately 90°. The beam rotator mayinclude, consist essentially of, or consist of (i) two confocalcylindrical lenses, (ii) a dove prism, or (iii) two reflectors. The beamoutput may include, consist essentially of, or consist of a partiallyreflective output coupler.

In another aspect, embodiments of the invention feature an alignablelaser system that includes, consists essentially of, or consists of alaser resonator and an alignment system. The laser resonator includes,consists essentially of, or consists of (i) a plurality of beam emittersfor emitting a plurality of input beams, (ii) a plurality of opticalelements for manipulating the input beams, and (iii) a beam output. Thelaser resonator is configured to spatially overlap the input beams alonga wavelength-beam-combining (WBC) dimension and output a resultingoutput beam from the beam output. The alignment system includes,consists essentially of, or consists of a beam profiler for generatingimages of the input beams emitted by the beam emitters.

Embodiments of the invention may include one or more of the following inany of a variety of combinations. The laser system may include acontroller configured to adjust the optical elements to align the inputbeams based at least on images generated by the beam profiler. Theoptical elements may include, consist essentially of, or consist of oneor more interleaver mirrors and/or one or more collimation lenses. Thecontroller may be configured to adjust the optical elements by tiltingone or more said interleaver mirrors and/or translating one or more saidcollimation lenses. At least one of, or even each of, the collimationlenses may be a slow-axis collimation lens. At least one of, or eveneach of, the collimation lenses may be a fast-axis collimation lens. Thelaser resonator may include, consist essentially of, or consist of (a) adispersive element for receiving and wavelength-dispersing the inputbeams, thereby forming a multi-wavelength beam, and (b) a partiallyreflective output coupler for (i) transmitting a first portion of themulti-wavelength beam as the output beam and (ii) reflecting a secondportion of the multi-wavelength beam back to the dispersive element (andthence to beam emitters to form external laser cavities and stabilizethe beam emitters to their emission wavelengths, each of which may bedifferent). The laser resonator may include, associated with each of thebeam emitters, a fast-axis collimator and an optical rotator forinducing beam rotation of approximately 90°. The dispersive element mayinclude, consist essentially of, or consist of a diffraction grating.The laser resonator may include (a) a plurality of first collimators,each first collimator receiving and collimating one or more beams fromone of the beam emitters, (b) a plurality of interleavers, eachinterleaver receiving the one or more beams from one of the firstcollimators, and (c) a second collimator for receiving all of the beamsfrom the plurality of interleavers, collimating the beams, andtransmitting the beams to the dispersive element. At least one, or eveneach first collimator may include, consist essentially of, or consist ofa slow-axis collimation lens. At least one, or even each firstcollimator may include, consist essentially of, or consist of afast-axis collimation lens. The laser resonator may include a foldingmirror disposed optically downstream of the dispersive element andoptically upstream of the partially reflective output coupler. Thepartially reflective output coupler may be the beam output. The beamprofiler may be disposed optically downstream of the beam output.

The alignment system may further include, consist essentially of, orconsist of a dispersive element, a first lens, and a second lens. Thedispersive element may receive the output beam and disperse the outputbeam to generate a plurality of dispersed beams in the WBC dimension.The first lens may have optical power in a non-WBC dimensionperpendicular to the WBC dimension. The first lens may be disposedoptically downstream of the beam output and optically upstream of thebeam profiler. The second lens may have optical power in the WBCdimension. The second lens may focus the dispersed beams on or towardthe beam profiler. The second lens may be disposed optically downstreamof the beam output (e.g., optically downstream of the dispersiveelement) and optically upstream of the beam profiler. The beam profilermay be configured to receive the plurality of dispersed beams andgenerate images of the relative positions of the dispersed beamsreceived by the beam profiler. The first lens may be movable between (i)a first position within a path of the output beam to thereby generate afar-field image via the beam profiler, and (ii) a second positionoutside the path of the output beam, whereby a near-field image isgenerated via the beam profiler. The alignment system may include athird lens. A focal length of the third lens may be less than a focallength of the first lens. The first lens and the third lens may beinterchangeable within a path of the output beam such that (i) when thefirst lens is within the path of the output beam a far-field image isgenerated via the beam profiler and (ii) when the third lens is withinthe path of the output beam a near-field image is generated via the beamprofiler.

The alignment system may include a third lens disposed opticallydownstream of the beam output and optically upstream of the first lens.A focal length of the third lens may be less than a focal length of thefirst lens. The third lens may be movable between (i) a first positionwithin a path of the output beam to thereby generate a near-field imagevia the beam profiler, and (ii) a second position outside the path ofthe output beam, whereby a far-field image is generated via the beamprofiler. The alignment system may include a beam rotator disposedoptically downstream of the beam output. The beam rotator may beconfigured to rotate the output beam by approximately 90°. The beamrotator may include, consist essentially of, or consist of (i) twoconfocal cylindrical lenses, (ii) a dove prism, or (iii) two reflectors.

In yet another aspect, embodiments of the invention feature an alignmentsystem for use with a laser resonator that spatially overlaps multipleinput beams along a wavelength-beam-combining (WBC) dimension andoutputs a resulting output beam from a beam output. The alignment systemincludes, consists essentially of, or consists of a dispersive element,a beam profiler, a first lens, a second lens, a third lens, and aplurality of optical elements. The dispersive element is configured todisperse beams in the WBC dimension. The beam profiler receives beamsand generates images of relative positions thereof. The first lens hasoptical power in a non-WBC dimension perpendicular to the WBC dimension.The first lens is disposed optically downstream of the beam output andoptically upstream of the beam profiler. The second lens has opticalpower in the WBC dimension. The second lens focuses dispersed beams onor toward the beam profiler. The second lens is disposed opticallydownstream of the beam output (e.g., optically downstream of thedispersive element) and optically upstream of the beam profiler. Thethird lens has optical power in the non-WBC dimension. The third lens isdisposed optically downstream of the beam output and optically upstreamof the beam profiler. The optical elements are configured to (i) receivethe output beam, (ii) direct a first portion of the output beam to thethird lens, and (iii) direct a second portion of the output beam to thefirst lens.

Embodiments of the invention may include one or more of the following inany of a variety of combinations. The second portion of the output beammay not be directed to the third lens. The first lens may be positionedto receive both the first portion of the output beam and the secondportion of the output beam. The optical elements may be configured todirect the first and second portions of the output beam to the firstlens at different angles. The dispersive element may be positioned toreceive and disperse the first portion of the output beam, whereby anear-field image of the input beams is generated via the beam profiler.The dispersive element may be positioned to receive and disperse thesecond portion of the output beam, whereby a far-field image of theinput beams is generated via the beam profiler. The dispersive elementmay include, consist essentially of, or consist of a diffractiongrating.

The first lens may be disposed optically upstream of the dispersiveelement. The third lens may be disposed optically upstream of the firstlens. A focal length of the first lens may be larger than a focal lengthof the second lens. The first lens, the second lens, and/or the thirdlens may include, consist essentially of, or consist of one or morecylindrical lenses. The optical distance between the first lens and thebeam profiler may be approximately equal to a focal length of the firstlens. The optical distance between the first lens and the beam outputmay be approximately equal to a focal length of the first lens. Theoptical distance between the second lens and the beam profiler may beapproximately equal to a focal length of the second lens. The opticaldistance between the second lens and the dispersive element may beapproximately equal to a focal length of the second lens. A focal lengthof the third lens may be less than a focal length of the first lens. Theoptical distance between the third lens and the beam output may beapproximately equal to a focal length of the third lens. The opticaldistance between the third lens and the beam profiler may be greaterthan a focal length of the third lens.

The alignment system may include a beam rotator disposed opticallydownstream of the beam output. The beam rotator may be configured torotate the output beam by approximately 90°. The beam rotator mayinclude, consist essentially of, or consist of (i) two confocalcylindrical lenses, (ii) a dove prism, or (iii) two reflectors. Thefirst lens may only have optical power in the non-WBC dimension. Thesecond lens may only have optical power in the WBC dimension. The thirdlens may only have optical power in the non-WBC dimension. At least oneof, or even each of, the optical elements may include, consistessentially of, or consist of a beam splitter and/or a reflector. Thebeam output may include, consist essentially of, or consist of apartially reflective output coupler.

In another aspect, embodiments of the invention feature an alignablelaser system that includes, consists essentially of, or consists of alaser resonator and an alignment system. The laser resonator includes,consists essentially of, or consists of (i) a plurality of beam emittersfor emitting a plurality of input beams, (ii) a beam output, and (iii)disposed optically upstream of the beam output, a plurality of firstoptical elements for manipulating the input beams. The laser resonatoris configured to spatially overlap the input beams along awavelength-beam-combining (WBC) dimension and output a resulting outputbeam from the beam output. The alignment system includes, consistsessentially of, or consists of a plurality of second optical elementsdisposed optically downstream of the beam output. The alignment systemis configured to simultaneously generate near-field and far-field imagesof the input beams without physical movement of the plurality of secondoptical elements.

Embodiments of the invention may include one or more of the following inany of a variety of combinations. The alignment system may include abeam profiler for generating the near-field and far-field images (e.g.,of the input beams of the laser resonator). The beam profiler may bedisposed optically downstream of the beam output. The laser system mayinclude a controller configured to adjust the first optical elements toalign the input beams based at least in part on the near-field and/orfar-field images. One or more of, or even each of, the first opticalelements may include, consist essentially of, or consist of one or moreinterleaver mirrors and/or one or more collimation lenses. Thecontroller may be configured to adjust the first optical elements bytilting one or more said interleaver mirrors and/or translating one ormore said collimation lenses. At least one of, or even each of, thecollimation lenses may be a slow-axis collimation lens. At least one of,or even each of, the collimation lenses may be a fast-axis collimationlens. The laser resonator may include (a) a dispersive element forreceiving and wavelength-dispersing the input beams, thereby forming amulti-wavelength beam and (b) a partially reflective output coupler for(i) transmitting a first portion of the multi-wavelength beam as theoutput beam and (ii) reflecting a second portion of the multi-wavelengthbeam back to the dispersive element. The laser resonator may include,associated with each of the beam emitters, a fast-axis collimator and anoptical rotator for inducing beam rotation of approximately 90°. Thedispersive element may include, consist essentially of, or consist of adiffraction grating. The laser resonator may include (a) a plurality offirst collimators, each first collimator receiving and collimating oneor more beams from one of the beam emitters, (b) a plurality ofinterleavers, each interleaver receiving the one or more beams from oneof the first collimators, and (c) a second collimator for receiving allof the beams from the plurality of interleavers, collimating the beams,and transmitting the beams to the dispersive element. At least one, oreven each, first collimator may include, consist essentially of, orconsist of a slow-axis collimation lens. At least one, or even each,first collimator may include, consist essentially of, or consist of afast-axis collimation lens. The laser resonator may include a foldingmirror disposed optically downstream of the dispersive element andoptically upstream of the partially reflective output coupler. Thepartially reflective output coupler may be the beam output.

The alignment system may include (i) a dispersive element configured todisperse beams in the WBC dimension, and (ii) a beam profiler forreceiving beams and generating images of relative positions thereof. Theplurality of second optical elements may include, consist essentiallyof, or consist of a first lens, a second lens, a third lens, and aplurality of third optical elements. The first lens may have opticalpower in a non-WBC dimension perpendicular to the WBC dimension. Thefirst lens may be disposed optically downstream of the beam output andoptically upstream of the beam profiler. The second lens may haveoptical power in the WBC dimension. The second lens may focus dispersedbeams on or toward the beam profiler. The second lens may be disposedoptically downstream of the beam output (e.g., optically downstream ofthe dispersive element) and optically upstream of the beam profiler. Thethird lens may have optical power in the non-WBC dimension. The thirdlens may be disposed optically downstream of the beam output andoptically upstream of the beam profiler. The third optical elements maybe configured to (i) receive the output beam, (ii) direct a firstportion of the output beam to the third lens, and (iii) direct a secondportion of the output beam to the first lens.

The second portion of the output beam may not be directed to the thirdlens. The first lens may be positioned to receive both the first portionof the output beam and the second portion of the output beam. The thirdoptical elements may be configured to direct the first and secondportions of the output beam to the first lens at different angles. Thedispersive element may be positioned to receive and disperse the firstportion of the output beam, whereby the near-field image of the inputbeams is generated via the beam profiler. The dispersive element may bepositioned to receive and disperse the second portion of the outputbeam, whereby the far-field image of the input beams is generated viathe beam profiler. At least one of, or even each of, the third opticalelements may include, consist essentially of, or consist of a beamsplitter and/or a reflector. The dispersive element may include, consistessentially of, or consist of a diffraction grating. The alignmentsystem may include a beam rotator disposed optically downstream of thebeam output. The beam rotator may be configured to rotate the outputbeam by approximately 90°. The beam rotator may include, consistessentially of, or consist of (i) two confocal cylindrical lenses, (ii)a dove prism, or (iii) two reflectors.

In yet another aspect, embodiments of the invention feature a method ofalignment for use with a laser resonator that spatially overlapsmultiple input beams along a wavelength-beam-combining (WBC) dimensionand outputs a resulting output beam from a beam output. The laserresonator includes a plurality of optical elements for manipulating theinput beams. The method includes, consists essentially of, or consistsof (a) generating, with a beam profiler, at least one of (i) anear-field image of the input beams or (ii) a far-field image of theinput beams, and (b) when one of the input beams is misaligned in atleast one of the near-field image or the far-field image, adjusting oneor more of the optical elements to align the input beam.

Embodiments of the invention may include one or more of the following inany of a variety of combinations. Both the near-field image and thefar-field image may be generated. The near-field image and the far-fieldimage may be generated sequentially or simultaneously. The method mayinclude, before generating the at least one of the near-field image orthe far-field image, (i) wavelength-dispersing the output beam togenerate a plurality of dispersed beams in the WBC dimension, and (ii)focusing the dispersed beams toward the beam profiler. The opticalelements may include, consist essentially of, or consist of one or moreinterleaver mirrors and/or one or more collimation lenses. Adjusting oneor more of the optical elements may include, consist essentially of, orconsist of tilting one or more said interleaver mirrors and/ortranslating one or more said collimation lenses. At least one of, oreven each of, the collimation lenses may be a slow-axis collimationlens. At least one of, or even each of, the collimation lenses may be afast-axis collimation lens. Generating the far-field image may include,consist essentially of, or consist of positioning a first lens within apath of the output beam. Generating the near-field image may include,consist essentially of, or consist of removing the first lens from thepath of the output beam. Generating the far-field image may include,consist essentially of, or consist of positioning a first lens within apath of the output beam. Generating the near-field image may include,consist essentially of, or consist of replacing the first lens with asecond lens having a focal length less than a focal length of the firstlens. Generating the near-field image may include, consist essentiallyof, or consist of positioning first and second lenses within a path ofthe output beam. Generating the far-field image may include, consistessentially of, or consist of removing the second lens from the path ofthe output beam. The second lens may have a focal length less than afocal length of the first lens. Generating the far-field image mayinclude, consist essentially of, or consist of directing a first portionof the output beam to a first lens. Generating the near-field image mayinclude, consist essentially of, or consist of directing a secondportion of the output beam to a second lens. The method may includerotating the output beam before generating the at least one of thenear-field image or the far-field image.

The laser resonator may include (a) a dispersive element for receivingand wavelength-dispersing the input beams, thereby forming amulti-wavelength beam and (b) a partially reflective output coupler for(i) transmitting a first portion of the multi-wavelength beam as theoutput beam and (ii) reflecting a second portion of the multi-wavelengthbeam back to the dispersive element. The laser resonator may include aplurality of beam emitters configured to emit the input beams. The laserresonator may include, associated with each of the beam emitters, afast-axis collimator and an optical rotator for inducing beam rotationof approximately 90°. The dispersive element may include, consistessentially of, or consist of a diffraction grating. The plurality ofoptical elements may include, consist essentially of, or consist of (a)a plurality of first collimators, each first collimator receiving andcollimating one or more input beams, (b) a plurality of interleavers,each interleaver receiving the one or more input beams from one of thefirst collimators, and (c) a second collimator for receiving all of theinput beams from the plurality of interleavers, collimating the beams,and transmitting the beams to the dispersive element. At least one, oreven each, first collimator may include, consist essentially of, orconsist of a slow-axis collimation lens. At least one, or even each,first collimator may include, consist essentially of, or consist of afast-axis collimation lens. The laser resonator may include a foldingmirror disposed optically downstream of the dispersive element andoptically upstream of the partially reflective output coupler. Thepartially reflective output coupler may be the beam output. The beamprofiler may be disposed optically downstream of the beam output.

These and other objects, along with advantages and features of thepresent invention herein disclosed, will become more apparent throughreference to the following description, the accompanying drawings, andthe claims. Furthermore, it is to be understood that the features of thevarious embodiments described herein are not mutually exclusive and mayexist in various combinations and permutations. As used herein, the term“substantially” means±10%, and in some embodiments, ±5%. The term“consists essentially of” means excluding other materials thatcontribute to function, unless otherwise defined herein. Nonetheless,such other materials may be present, collectively or individually, intrace amounts. Herein, the terms “radiation” and “light” are utilizedinterchangeably unless otherwise indicated. Herein, “downstream” or“optically downstream,” is utilized to indicate the relative placementof a second element that a light beam strikes after encountering a firstelement, the first element being “upstream,” or “optically upstream” ofthe second element. Herein, “optical distance” between two components isthe distance between two components that is actually traveled by lightbeams; the optical distance may be, but is not necessarily, equal to thephysical distance between two components due to, e.g., reflections frommirrors or other changes in propagation direction experienced by thelight traveling from one of the components to the other. Distancesutilized herein may be considered to be “optical distances” unlessotherwise specified.

BRIEF DESCRIPTION OF THE DRAWINGS

In the drawings, like reference characters generally refer to the sameparts throughout the different views. Also, the drawings are notnecessarily to scale, emphasis instead generally being placed uponillustrating the principles of the invention. In the followingdescription, various embodiments of the present invention are describedwith reference to the following drawings, in which:

FIG. 1 is a schematic diagram of a wavelength beam combining (WBC)resonator, in the WBC dimension, in accordance with embodiments of theinvention;

FIG. 2 is a schematic diagram of portions of a WBC resonator, in the WBCdimension, in accordance with embodiments of the invention;

FIG. 3 is a schematic diagram of portions of a WBC resonator, in thenon-WBC dimension, in accordance with embodiments of the invention;

FIG. 4A is a schematic diagram of an alignment system, in the WBCdimension, in accordance with embodiments of the invention;

FIG. 4B is a schematic diagram of an alignment system, in the non-WBCdimension, in accordance with embodiments of the invention;

FIGS. 5A and 5B are, respectively, exemplary far-field and near-fieldimages depicting beams misaligned in the non-WBC dimension;

FIGS. 5C and 5D are, respectively, exemplary far-field and near-fieldimages depicting beams aligned in the non-WBC dimension;

FIG. 6A is a schematic diagram of an alignment system, in the non-WBCdimension, in accordance with embodiments of the invention;

FIG. 6B is a schematic diagram of an alignment system, in the non-WBCdimension, in accordance with embodiments of the invention;

FIG. 7A is a schematic diagram of an alignment system in accordance withembodiments of the invention;

FIGS. 7B-7D are schematic diagrams of exemplary beam rotators inaccordance with embodiments of the invention; and

FIG. 8 is a schematic diagram of an alignment system in accordance withembodiments of the invention.

DETAILED DESCRIPTION

FIG. 1 schematically depicts various components of a WBC resonator 100which, in the depicted embodiment, combines the beams emitted by elevendifferent diode bars (as utilized herein, “diode bar” refers to anymulti-beam emitter, i.e., an emitter from which multiple beams areemitted from a single package). Embodiments of the invention may beutilized with fewer or more than eleven emitters. In accordance withembodiments of the invention, each emitter may emit a single beam, or,each of the emitters may emit multiple beams. The view of FIG. 1 isalong the WBC dimension, i.e., the dimension in which the beams from thebars are combined. The resonator 100 features eleven diode bars 110(110-1-110-11), and each diode bar 110 includes, consists essentiallyof, or consists of an array (e.g., one-dimensional array) of emittersalong the WBC dimension. Each emitter of a diode bar 110 emits anon-symmetrical beam having a larger divergence in one direction (knownas the “fast axis,” here oriented vertically relative to the WBCdimension) and a smaller divergence in the perpendicular direction(known as the “slow axis,” here along the WBC dimension).

In various embodiments, each of the diode bars 110 is associated with(e.g., attached or otherwise optically coupled to) a fast-axiscollimator (FAC)/optical twister microlens assembly that collimates thefast axis of the emitted beams while rotating the fast and slow axes ofthe beams by 90°, such that the slow axis of each emitted beam isperpendicular to the WBC dimension downstream of the microlens assembly.The microlens assembly also converges the chief rays of the emittersfrom each diode bar 110 toward the dispersive element 120. Suitablemicrolens assemblies are described in U.S. Pat. No. 8,553,327, filed onMar. 7, 2011, and U.S. Pat. No. 9,746,679, filed on Jun. 8, 2015, theentire disclosure of each of which is hereby incorporated by referenceherein.

Embodiments of the invention presented herein associate both a FAC lensand an optical twister (e.g., as a microlens assembly) with each of theemitted beams, and thus SAC lenses (as detailed below) affect the beamsin the non-WBC dimension. In other embodiments, the emitted beams arenot rotated, and FAC lenses may be utilized to alter pointing angles inthe non-WBC dimension. Thus, it is understood that references to SAClenses herein generally refer to lenses having power in the non-WBCdimension, and such lenses may be or include FAC lenses in variousembodiments.

As shown in FIG. 1 , resonator 100 also features a set of SAC lenses130, one SAC lens 130 associated with, and receiving beams from, one ofthe diode bars 110. Each of the SAC lenses 130 collimates the slow axesof the beams (i.e., in the non-WBC dimension) emitted from a singlediode bar 110. After collimation in the slow axis by the SAC lenses 130,the beams propagate to a set of interleaving mirrors 140, which redirectthe beams 150 toward the dispersive element 120. (In FIG. 1 , the beams150 are the center chief rays representing the eleven assembled beamsfrom the eleven diode bars 110.) In various embodiments, the arrangementof the interleaving mirrors 140 enables the free space between the diodebars 110 to be minimized. The dispersive element 120 multiplexes theindividual spatially separated beams into a single beam having multiplewavelengths (i.e., the wavelengths of the individual beams). Upstream ofthe dispersive element 120 (which may include, consist essentially of,or consist of, for example, a diffraction grating such as thetransmissive diffraction grating depicted in FIG. 1 , or a reflectivediffraction grating), a lens 160 collimates the individual beams (e.g.,sub-beams, rather than the chief rays) from the diode bars 110. Invarious embodiments, the lens 160 is disposed at an optical distanceaway from the diode bars 110 that is substantially equal to the focallength of the lens 160. Note that the overlap of the chief rays at thedispersive element 120 is primarily due to the redirection of theinterleaving mirrors 140, rather than the focusing power of the lens160.

Also depicted in FIG. 1 are lenses 170, 175, which form an opticaltelescope for mitigation of optical cross-talk, as disclosed in U.S.Pat. No. 9,256,073, filed on Mar. 15, 2013, and U.S. Pat. No. 9,268,142,filed on Jun. 23, 2015, the entire disclosure of each of which is herebyincorporated by reference herein. Resonator 100 may also include one ormore optional folding mirrors 180 for redirection of the beams such thatthe resonator 100 may fit within a smaller physical footprint. Thedispersive element 120 combines the beams from the diode bars 110 into asingle, multi-wavelength beam, which propagates to a partiallyreflective output coupler 190. The coupler 190 transmits a portion ofthe beam as the output beam of resonator 100 while reflecting anotherportion of the beam back to the dispersive element 120 and thence to thediode bars 110 as feedback to stabilize the emission wavelengths of eachof the beams (which are typically different from each other).

As shown in FIG. 1 , each diode bar 110 has a corresponding SAC 130 anda corresponding interleaver mirror 140, and all the optics opticallydownstream of the interleaver mirrors 140 are shared by all the diodebars 110.

Generally, WBC resonators are desirably aligned on both WBC and non-WBCdimensions. That is, beams from different diodes (i.e., the individualemitters in the diode bars) are desirably adjusted to be overlapped atthe dispersive element 120 (e.g., approximately at the center thereof)in both WBC and non-WBC dimensions and approximately normal to theoutput coupler 190 for stable lasing.

Individual emitters may emit at free-running (i.e., unlocked)wavelengths if the resonator is misaligned, particularly if it ismisaligned in the non-WBC dimension or severely misaligned in the WBCdimension. For example, an emitter may be severely misaligned in the WBCdimension if the misalignment thereof shifts the emission to anon-lasing region (i.e., out of the emitter effective gain bandwidth),or if the emitter output is severely clipped, e.g., >20% clipping inpower and/or beam size, for example, at the optics due to off-centeringat one or more optics. Assuming, as an example, the resonator dispersiveelement is aligned at the Littrow angle (i.e., where the diffractionangle is equal to the angle of incidence), for an emitter wavelength of975 nm, with line density of 1.64/μm, and disregarding power clipping, a20 mrad misalignment relative to the orientation of the dispersiveelement in the WBC dimension will cause a wavelength shift of about 8nm, which may be sufficiently large to move the “lasing wavelength” outof the diode emitter bandwidth (typically ranging from 14 nm to 20 nm),particularly when considering the typically over 10 nm intrinsic shiftof the gain curve of a diode emitter associated with emitter temperaturechange from room temperature (or coolant temperature) to a typicaloperating temperature (e.g., ranging from approximately 60° C. toapproximately 70° C., or even higher).

Typically, once aligned in the non-WBC dimension, emitters will belocked in at resonator wavelengths satisfying the grating diffractionequation, i.e., sin(Ai)+sin(B)=pλi, where Ai is the incident angle onthe dispersive element 120 of the i-th emitter, λi is the lasingwavelength of the i-th emitter, and B and p are the diffraction angleand the grating line density, respectively.

Since emitters are typically locked at wavelengths having diffractionangles normal to the output coupler 190 in the WBC dimension, anyalignment change in the WBC dimension will result in a wavelength shift,but will generally not cause other serious issues such as significantpower drop, as long as the shifted wavelengths remain within the workingbands of individual emitters. (For example, a diode emitter emitting atthe 975 nm region typically has a gain bandwidth (full width at 90%)ranging from 14 nm to 20 nm. The working band of an emitter is equal toits gain bandwidth if not considering temperature change. However, theworking band may be reduced to less than a few nm if the resonator isrequired to have a quick cold start.) In contrast, misalignments in thenon-WBC dimension may have more severe consequences.

FIG. 2 illustrates a consequence of misalignment of a WBC resonator 200in the WBC dimension. For illustrative purposes and for clarity,resonator 200 is depicted with only a single diode bar 110, but it isunderstood that the illustrated principle may apply to resonators havingmultiple diode bars 110. In addition, only the beam from a singleemitter (the i-th emitter) is shown for clarity. In a state ofalignment, the emitter is locked at wavelength M, and its chief ray 210propagates along a direction 210 u, which passes through the centers ofeach of the optical elements and is normal to the coupler 190 in bothWBC and non-WBC directions.

In an exemplary embodiment, misalignment in the WBC dimension is causedby a small angular change (e.g., rotation) of the interleaver 140corresponding to the emitter, which causes the emitter chief ray 210 topropagate along a direction 210 v. This direction 210 v diverges fromthe original direction 210 u by an angle α in the WBC dimension. Inaddition, the change in angle of incidence from Ai to an approximateangle of (Ai+α) on the dispersive element 120 results in a wavelengthshift from Xi to (λi+Δλ), determined by the grating equation:sin(Ai+α)+sin(B)≈p×(λi+Δλ).

As illustrated in the magnified portion of FIG. 2 , misalignment in theWBC dimension will also result in a decentering distance, δ, at theoutput coupler 190, which may degrade the beam quality in WBC dimensionby a factor of 1+δ/S, where S is the beam size in the WBC dimension atthe output coupler 190. Since lenses 170 and 175 are typically in aconfocal arrangement (i.e., forming an optical telescope), thedecentering distance δ may be estimated by δ≈α×D/R×cos(B)/cos(Ai), whereD is the distance from the interleaver 140 to the dispersive element120, and R is the ratio of focal lengths of lenses 170,175, which invarious embodiments is within the range of approximately 3 toapproximately 20. If the dispersive element 120 is configured at theLittrow angle, i.e., cos(B)/cos(Ai)≈1, then δ≈α×D/R.

In an exemplary embodiment, it may be assumed that D=1000 mm, R=10,λi=0.975 μm, and the dispersive element 120 is oriented at the Littrowangle with line density p=1.6/μm. The resulting wavelength shift and thedecentering distance due to misalignment of angle α may be estimated byΔλ(μm)≈0.4×α and δ(mm)≈100×α. If α=1 mrad, then Δλ≈0.4 nm and δ≈100 μm.In such an example, the misalignment in the WBC dimension may notsubstantially affect emitter lasing, and may not cause stability issuesfor the WBC resonator. A wavelength shift of approximately 0.4 nm issmall compared to an over 15 nm gain width for a diode laser at the 1 μmemission regime. In addition, a decentering distance of 100 μm may beequivalent to about 5-10% of the beam size in the WBC dimension, whichcorresponds to a 5-10% beam quality degradation in the WBC dimension.The severity of such a degradation may depend on the particularresonator and application in which it is deployed.

FIG. 3 depicts portions of a resonator 300 that is similar to resonator200 of FIG. 2 but in the non-WBC dimension, in order to illustrate anexample misalignment in the non-WBC dimension. For simplicity, only theinterleaver 140, the dispersive element 120, and the output coupler 190are depicted. Lenses 150, 170, and 175 shown in FIG. 2 are assumed tolack optical power in the non-WBC dimension, although need not be thecase in other embodiments of the present invention. A chief ray 310 ofthe i-th emitter (not shown) is perfectly aligned along direction 310 u,which is normal to the coupler 190 and passes through the center of thecoupler 190. The coupler is a partial reflector that splits theresonator beam into an output beam 320 and a feedback beam 330. Thefeedback beam 330 is normal to the coupler 190 and will thereforepropagate back to the dispersive element 120 and thence to thecorresponding emitter, thereby forming a stable resonator between theemitter and the coupler 190.

In an exemplary embodiment, misalignment in the non-WBC dimensionresults from a slight tilt of the interleaver mirror 140 in the non-WBCdimension, which causes the chief ray 310 to propagate along amisaligned direction 310 v, which deviates from direction 310 u by anangle β In contrast with the WBC-dimension case depicted in FIG. 2 , inthe non-WBC dimension, the laser beam 310 from the example i-th emitter(either wavelength-locked or free-running) will propagate along themisaligned direction 310 v all the way to the coupler 190 as illustratedin FIG. 3 . As shown, the example misalignment causes the misalignedoutput beam 340 to have relative large decentering distance (Δ) and anon-zero pointing error (β), resulting in less efficient resonatorfeedback since the feedback beam 350 is misaligned by 2β from the idealnormal direction along which feedback beam 330 propagates.

For illustrative purposes, it may be assumed that the emitter slow axisis in the non-WBC dimension and is collimated by a SAC lens (e.g., SAClens 130 in FIGS. 1 and 2 ) having a 50 mm focal length, which resultsin a slow axis beam size at the coupler 190 of about 6 mm. Furtherassuming the maximum acceptable slow axis decentering distance is 0.6 mm(corresponding to 10% beam quality degradation) and an optical distancefrom the interleaver 140 to the coupler 190 of 1.5 m, then, from theviewpoint of beam decentering, the maximum acceptable misalignment angleβ is calculated to be 0.4 mrad. However, from the viewpoint of resonatorfeedback, misalignment of 0.4 mrad will result in a 40 μm displacementof the feedback beam at the emitter surface in the slow axis; therefore,the feedback will be 40% less efficient (for an example emitter size of100 μm). Displacement of the feedback beam relative to the correspondingemitter beam not only causes a decrease in power, but also may result inunstable wavelength locking (i.e., unstable resonator power) and adistorted beam shape at the output. Thus, generally speaking, WBCresonators are much more sensitive to misalignment in the non-WBCdimension than in the WBC dimension. In various embodiments, for a WBCresonator similar to that of FIG. 1 , the misalignment in the slow axis(i.e., the non-WBC dimension) is desirably controlled to be less than orequal to approximately 0.1 mrad.

FIGS. 4A and 4B depict portions of an alignment system 400 in accordancewith various embodiments of the invention. As shown, the alignmentsystem 400 includes a first cylindrical lens 410, a dispersion element420, a second cylindrical lens 430, and a beam profiler 440. FIGS. 4Aand 4B depict the alignment system 400 in the WBC dimension and thenon-WBC direction, respectively. The lens 410 has optical power in thenon-WBC dimension and a focal length f1, and the lens 430 has opticalpower in the WBC dimension and a focal length f2. The dispersive element420 may include, consist essentially of, or consist of, for example, adiffraction grating such as a transmissive diffraction grating or areflective diffraction grating.

The beam profiler 440 may include, consist essentially of, or consistof, for example, a camera or other image sensor (e.g., a CCD sensor,CMOS sensor, or other photoresponsive sensor), and may include a displayor be operatively coupled to a display. For example, beams incident ofthe beam profiler 440 may be displayed on the display in order todetermine their alignment with each other. Beam profilers 440 arecommercially available and may be provided and utilized without undueexperimentation. For example, the beam profiler 440 may include, consistessentially of, or consist of, for example, one of the WinCamD series ofbeam profilers available from DataRay, Inc. of Redding, Calif. Invarious embodiments, the beam profiler 440 may be or include a physicalscreen (e.g., a near-infrared sensor plate for emitters emitting in thenear-infrared regime, a white board or other plate for emitters emittingin the visible regime, or a UV-sensitive plate for emitters emitting inthe UV regime), or a conventional camera or other collection of imagesensors (e.g., two-dimensional sensors).

The alignment system 400 accepts a WBC resonator beam 450, whichincludes, consists essentially of, or consists of n sub-bands ofwavelengths (Δλi, i=1:n). The beam 450 is dispersed by the dispersiveelement 420 in the WBC dimension, and the chief rays of the dispersedbeams are collimated by lens 430. In general, the collimation of thechief rays of the dispersed beams produces well-defined overall imagedimensions and beam separations at the beam profiler 440. In variousembodiments, the lens 430 is located one focal length (i.e., of lens430) downstream of the dispersive element 420. The lens 430 also focusesthe individual beams on the beam profiler 440, which in variousembodiments is located one focal length (i.e., of lens 430) downstreamof the lens 430. In various embodiments, the resonator beam 450 is theoutput beam produced by WBC resonator 100 or a similar resonator.

While in the embodiments of alignment system 400 depicted in FIGS. 4Aand 4B the lens 430 is located optically downstream of the dispersiveelement 420, in other embodiments the lens 430 may be located opticallyupstream of the dispersive element 420. In such embodiments, the lens430 will still focus the individual beams on the beam profiler 440 butwill typically not collimate the chief rays of the beams. In addition,such embodiments may not be preferred from the point of view ofaberration, as the dispersive element 420 may induce more aberration tohighly focused or diverged beams.

In the non-WBC dimension, as shown in FIG. 4B, the lens 410 may belocated one focal length (i.e., of lens 410) upstream of the beamprofiler 440. In various embodiments, the focal length f1 of lens 410 islonger than the focal length f2 of lens 430, and the lens 410 isdisposed at a position upstream of the dispersive element 420.

As shown in FIG. 4B, the lens 410 may be disposed either at a position460 in the path of the resonator beam 450 (e.g., so that the beam iscentered approximately on the lens 410) or in a position 465 outside ofthe beam path. This results in a far-field image 470 or a near-fieldimage 475 on the beam profiler 440, respectively. Assuming that thecenter line of the beam profiler 440 in the WBC dimension corresponds tothe case of zero decentering distance and zero pointing error at theoutput coupler (e.g., coupler 190 in FIG. 1 ) in the non-WBC dimensionfor all the sub-beams in the output beam 450, then the amount ofdecentering distance of a sub-beam at far-field 470 or at near-field 475may proportionally indicate the amount of pointing error or decenteringdistance of the corresponding sub-beam at the resonator output in thenon-WBC dimension. In this manner, the alignment system 400 shown inFIGS. 4A and 4B may be an effective tool to optimize alignment ofmulti-wavelength resonators, such as WBC resonators.

FIGS. 5A and 5B depict example far-field and near-field images with afew sub-beams (beams #3, #7, and #10 from the left side of the images)misaligned in the non-WBC dimension in a WBC resonator similar toresonator 100 depicted in FIG. 1 . Each image includes 11 sub-beamimages corresponding to 11 diode bars (e.g., diode bars 110 in FIG. 1 )or 11 sub-bands of wavelengths (Δλi, i=1:11) as shown in FIGS. 4A and4B. Each sub-band may include, consist essentially of, or consist ofmultiple different wavelengths because each diode bar may include,consist essentially of, or consist of an array of emitters. The spectralgaps (or “dead spaces”) between adjacent diode bars allow sub-beamimages to be separated without overlap on the beam profiler 440. Invarious embodiments, sub-beam images are readily identifiable even whenpartially overlapping on the beam profiler 440. Thus, even if fullsub-image separation on the beam profiler 440 requires, for example, aspectral gap of at least 20%, embodiments of the invention mayfacilitate identification and alleviation of misalignments even forspectral gaps between emitters of at least 10%, or even at least 5%.

The resulting images from the beam profiler 440 efficiently indicate ifand what individual beam emitters (e.g., diode bars) are misaligned. Invarious embodiments, misalignment (e.g., decentering) in the far-fieldimage may be adjusted or alleviated via tilt adjustment, in the non-WBCdimension, of the corresponding mirror (e.g., interleaver 140 in FIG. 1) for the emitter, as described in the '001 application. In variousembodiments, tilt adjustment of the interleaver mirrors may reduce orminimize misalignment (e.g., decentering) in the near-field image aswell. In other embodiments, beams aligned in the far field but not inthe near field may be aligned via iteratively translating the positionof the corresponding SAC lens (e.g., in the slow-axis, non-WBCdimension) and adjusting the tilt of the interleaver mirror 130 in thenon-WBC dimension, e.g., as described in the '001 application.

As mentioned above, misalignment in the non-WBC dimension may greatlyreduce resonator power and even cause corresponding emitters to emit atunlocked wavelengths. However, unlike conventional lasers, such assolid-state lasers and gas lasers, the use of output power as analignment indicator for WBC resonators may be largely ineffective,because diodes or emitters in typical WBC resonators operateindependently and may each only contribute a small portion of power tothe resonator total output. Thus, misalignment of a single diode may bedifficult to detect on the basis of total output power. In contrast,optical techniques in accordance with embodiments of the inventioneffectively reveal misalignment of individual emitters. FIGS. 5C and 5Dshow example far-field and near-field images, respectfully, with all thesub-beams well-aligned in the non-WBC dimension.

Various embodiments of the invention may automatically align emitters inthe non-WBC dimension in response to the images acquired by the beamprofiler 440. For example, systems in accordance with embodiments of theinvention may include a controller 195 (see FIG. 1 ) that adjusts thetilt of interleaver mirrors 140 and/or the position (i.e., translation)of SAC lenses 130, at least in the non-WBC dimension, in order to reduceor substantially eliminate misalignment depicted in the images acquiredby the beam profiler 440. In accordance with various embodiments, thecontroller 195 may utilize conventional image processing software oralgorithms to measure the alignment or misalignment of the emittersshown in the near-field and far-field images produced by the beamprofiler 440 and adjust (e.g., via computer control of tip/tilt stages,stepper motors, etc.) the tilt of interleaver mirrors 140 and/or theposition (i.e., translation) of SAC lenses 130 to alleviate themisalignment, as detailed above.

The controller 195 may be provided as either software, hardware, or somecombination thereof. For example, the system may be implemented on oneor more conventional server-class computers, such as a PC having a CPUboard containing one or more processors such as the Pentium or Celeronfamily of processors manufactured by Intel Corporation of Santa Clara,Calif., the 680×0 and POWER PC family of processors manufactured byMotorola Corporation of Schaumburg, Ill., and/or the ATHLON line ofprocessors manufactured by Advanced Micro Devices, Inc., of Sunnyvale,Calif. The processor may also include a main memory unit for storingprograms and/or data relating to the methods described herein. Thememory may include random access memory (RAM), read only memory (ROM),and/or FLASH memory residing on commonly available hardware such as oneor more application specific integrated circuits (ASIC), fieldprogrammable gate arrays (FPGA), electrically erasable programmableread-only memories (EEPROM), programmable read-only memories (PROM),programmable logic devices (PLD), or read-only memory devices (ROM). Insome embodiments, the programs may be provided using external RAM and/orROM such as optical disks, magnetic disks, as well as other commonlyused storage devices. For embodiments in which the functions areprovided as one or more software programs, the programs may be writtenin any of a number of high level languages such as PYTHON, FORTRAN,PASCAL, JAVA, C, C++, C#, BASIC, various scripting languages, and/orHTML. Additionally, the software may be implemented in an assemblylanguage directed to the microprocessor resident on a target computer;for example, the software may be implemented in Intel 80×86 assemblylanguage if it is configured to run on an IBM PC or PC clone. Thesoftware may be embodied on an article of manufacture including, but notlimited to, a floppy disk, a jump drive, a hard disk, an optical disk, amagnetic tape, a PROM, an EPROM, EEPROM, field-programmable gate array,or CD-ROM.

In various embodiments, the near-field image 475 produced by beamprofiler 440 in FIG. 4B is a straight projection of the beam 450.Therefore, decentering distances of sub-beam images on the near-fieldimage (e.g., as shown in FIG. 5B) may not directly reflect the actualdecentering distances of the corresponding sub-beams on the outputcoupler of a WBC resonator. This may be addressed via an alignmentsystem 600 in accordance with various embodiments of the presentinvention as depicted in FIGS. 6A and 6B. In FIG. 6A, a near-field image610 is obtained by replacing the first lens 410 with a third lens 620having focal length f3 shorter than f1, which satisfies the lens imagingequation 1/S1+1/S2=1/f3, where S1 and S2 are the distances from lens 620to the coupler 190 and to the beam profiler 440, respectively. SinceS2=f1, then S1=f1×f3/(f1−f3).

In a similar embodiment depicted in FIG. 6B, a near-field image 630 isobtained by adding a third lens 640 having focal length f3, where S1=f3.In various embodiments, as shown in FIG. 6B, the third lens 640 isdisposed optically downstream of the beam output (e.g., the coupler 190)and optically upstream of the lens 410. In either of the alignmentsystems 600 depicted in FIGS. 6A and 6B, the far-field image may beobtained by having only the first lens (or lens set) 410 in place andkeeping S2=f1. Since the near-field image 610 or 630 is an image of thebeam 450 at the coupler 190, the decentering distances of the sub-beamimages on the near-field image will directly and proportionally reflectthe decentering distances at the coupler 190 of those sub-beams.

FIG. 7A depicts an alignment system 700 in accordance with variousembodiments of the invention that is similar to alignment system 600 ofFIG. 6B, but with the addition of a beam rotator 710 disposed opticallydownstream of the output coupler 190. In various embodiments, the beamrotator 710 rotates the output beam 450 by approximately 90°, andtherefore the alignment system 700 will now depict sub-beam misalignmentand pointing errors in the WBC direction. In various embodiments, thebeam rotator 710 is movable into and out of the path of the beam 450,thereby enabling selection of detection (and resulting alleviation) ofmisalignment along either the non-WBC dimension or the WBC dimension.

Exemplary beam rotators 710 in accordance with embodiments of thepresent invention are depicted in FIGS. 7B-7D. For example, FIG. 7Bdepicts beam rotator 710 as a confocal pair of cylindrical lensesoriented at 45° with respect to the vertical and horizontal dimensionsof the beam. FIG. 7C depicts beam rotator 710 as a dove prism orientedat 45° with respect to the vertical and horizontal dimensions of thebeam. FIG. 7D depicts beam rotator 710 as a pair of mirrors, where thefirst mirror reflects the beams 90° in a first plane, and the secondmirror reflects the beams 90° in a second plane orthogonal to the firstplane.

FIG. 8 depicts an alignment system 800 in accordance with embodiments ofthe invention. In various embodiments, the alignment system 800 obtainsa far-field image 810 and a near-field image 820 simultaneously withoutphysical movement of a lens or other optical element. In the illustratedexample alignment system 800, the beam 450 is received at beam splitter830, where it is split so that one portion of the beam propagatesthrough both lenses 640, 410, while the other portion of the beampropagates only through lens 410 (after being redirected around lens640). Both beam portions then propagate to the beam profiler 440 fordisplay of the near-field and far-field images. As shown in theexemplary embodiment of FIG. 8 , one portion of the beam is redirectedaround lens 640 by reflectors (e.g., mirrors) 840, 850, which thenredirect the beam portion to a beam splitter 860 where it rejoins theprimary beam path. While FIG. 8 shows two reflectors 840, 850 utilizedto redirect the beam portion around lens 640, various embodiments mayutilize only one reflector or more than two reflectors to redirect thebeam portion.

As shown in FIG. 8 , the angle of one or more of the beam splittersand/or reflectors may be adjusted so that the near-field and far-fieldimages do not overlap with each other. In this manner, the near-fieldand far-field images of the beam 450 may be monitored simultaneouslywhile misalignment of the emitters is reduced or substantiallyeliminated.

The terms and expressions employed herein are used as terms ofdescription and not of limitation, and there is no intention, in the useof such terms and expressions, of excluding any equivalents of thefeatures shown and described or portions thereof, but it is recognizedthat various modifications are possible within the scope of theinvention claimed.

1.-25. (canceled)
 26. An alignable laser system comprising: a laserresonator comprising (i) a plurality of beam emitters for emitting aplurality of input beams, (ii) a plurality of optical elements formanipulating the input beams, and (iii) a beam output, wherein the laserresonator is configured to spatially overlap the input beams along awavelength-beam-combining (WBC) dimension and output a resulting outputbeam from the beam output; and an alignment system comprising a beamprofiler for generating images of the input beams emitted by the beamemitters.
 27. The laser system of claim 26, further comprising acontroller configured to adjust the optical elements to align the inputbeams based at least on images generated by the beam profiler.
 28. Thelaser system of claim 27, wherein the optical elements comprise one ormore interleaver mirrors and/or one or more collimation lenses.
 29. Thelaser system of claim 28, wherein the controller is configured to adjustthe optical elements by tilting one or more said interleaver mirrorsand/or translating one or more said collimation lenses.
 30. The lasersystem of claim 28, wherein at least one of the collimation lenses is aslow-axis collimation lens.
 31. The laser system of claim 26, whereinthe laser resonator comprises: a dispersive element for receiving andwavelength-dispersing the input beams, thereby forming amulti-wavelength beam; and a partially reflective output coupler for (i)transmitting a first portion of the multi-wavelength beam as the outputbeam and (ii) reflecting a second portion of the multi-wavelength beamback to the dispersive element.
 32. The laser system of claim 31,wherein the laser resonator comprises, associated with each of the beamemitters: a fast-axis collimator; and an optical rotator for inducingbeam rotation of approximately 90°.
 33. The laser system of claim 31,wherein the dispersive element comprises a diffraction grating.
 34. Thelaser system of claim 31, wherein the laser resonator comprises: aplurality of first collimators, each first collimator receiving andcollimating one or more beams from one of the beam emitters; a pluralityof interleavers, each interleaver receiving the one or more beams fromone of the first collimators; and a second collimator for receiving allof the beams from the plurality of interleavers, collimating the beams,and transmitting the beams to the dispersive element.
 35. The lasersystem of claim 34, wherein each first collimator comprises a slow-axiscollimation lens.
 36. The laser system of claim 31, wherein the laserresonator comprises a folding mirror disposed optically downstream ofthe dispersive element and optically upstream of the partiallyreflective output coupler.
 37. The laser system of claim 31, wherein thepartially reflective output coupler is the beam output.
 38. The lasersystem of claim 26, wherein the beam profiler is disposed opticallydownstream of the beam output.
 39. The laser system of claim 26, whereinthe alignment system comprises: a dispersive element for receiving theoutput beam and dispersing the output beam to generate a plurality ofdispersed beams in the WBC dimension; disposed optically downstream ofthe beam output and optically upstream of the beam profiler, a firstlens having optical power in a non-WBC dimension perpendicular to theWBC dimension; and disposed optically downstream of the dispersiveelement and optically upstream of the beam profiler, a second lens,having optical power in the WBC dimension, for focusing the dispersedbeams on the beam profiler, wherein the beam profiler is configured toreceive the plurality of dispersed beams and generate images of therelative positions of the dispersed beams received by the beam profiler.40. The laser system of claim 39, wherein the first lens is movablebetween (i) a first position within a path of the output beam to therebygenerate a far-field image via the beam profiler, and (ii) a secondposition outside the path of the output beam, whereby a near-field imageis generated via the beam profiler.
 41. The laser system of claim 39,wherein: the alignment system comprises a third lens; a focal length ofthe third lens is less than a focal length of the first lens; and thefirst lens and the third lens are interchangeable within a path of theoutput beam such that (i) when the first lens is within the path of theoutput beam a far-field image is generated via the beam profiler and(ii) when the third lens is within the path of the output beam anear-field image is generated via the beam profiler.
 42. The lasersystem of claim 39, wherein the alignment system comprises a third lensdisposed optically downstream of the beam output and optically upstreamof the first lens.
 43. The laser system of claim 42, wherein a focallength of the third lens is less than a focal length of the first lens.44. The laser system of claim 42, wherein the third lens is movablebetween (i) a first position within a path of the output beam to therebygenerate a near-field image via the beam profiler, and (ii) a secondposition outside the path of the output beam, whereby a far-field imageis generated via the beam profiler.
 45. The laser system of claim 39,wherein the alignment system comprises a beam rotator disposed opticallydownstream of the beam output.
 46. The laser system of claim 45, whereinthe beam rotator is configured to rotate the output beam byapproximately 90°.
 47. The laser system of claim 45, wherein the beamrotator comprises (i) two confocal cylindrical lenses, (ii) a doveprism, or (iii) two reflectors. 48.-121. (canceled)